Plasma processing for advanced microelectronics beyond CMOS

The scientific study of plasma discharges and their material interactions has been crucial to the development semiconductor process engineering and, by extension, entire microelectronics industry. In recent years, proliferation big data business model led heightened interest in technology candidates with potential supplant CMOS architectures critical metrics such as computational capacity or power consumption. These novel technologies share many common elements existing logic memory devices, but impact mass fabrication techniques on performance is largely unknown due differences underlying physics operation. Two components are thus vital this endeavor: fundamental evaluation any emerging ability tailor aspect necessary produce desired specifications. article, we review relevant advances plasma-induced damage mechanisms well characterization methods diagnostic probes simulation tools. We also provide an outlook for application doping, area-selective etch/deposition, heterogeneous integration. frontiers new computing paradigms can only be explored through a focus atomic scale engineering, progress field science supplies toolset.